Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10386722 | Ebeam staggered beam aperture array | Donald W. Nelson, Mark C. Phillips | 2019-08-20 |
| 10338474 | Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography | Shakul Tandon, Charles H. Wallace, Paul A. Nyhus | 2019-07-02 |
| 10290528 | Ebeam align on the fly | Donald W. Nelson, Mark C. Phillips | 2019-05-14 |
| 10236161 | Fine alignment system for electron beam exposure system | — | 2019-03-19 |
| 10216087 | Ebeam universal cutter | Donald W. Nelson, Mark C. Phillips | 2019-02-26 |
| 10191376 | Cross scan proximity correction with ebeam universal cutter | — | 2019-01-29 |