Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10514605 | Resist multilayer film-attached substrate and patterning process | Seiichiro Tachibana, Tsutomu Ogihara, Hiroko Nagai, Romain Lallement | 2019-12-24 |
| 10254652 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Ekmini Anuja De Silva, Indira Seshadri | 2019-04-09 |