Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10438849 | Microwave anneal to improve CVD metal gap-fill and throughput | He Ren, Jie Zhou, Guannan Chen, Michael W. Stowell, Bencherki Mebarki +3 more | 2019-10-08 |
| 10410918 | Enhanced cobalt agglomeration resistance and gap-fill performance by ruthenium doping | Zhiyuan Wu, Nikolaos Bekiaris, Jin-Hee Park, Mark Lee | 2019-09-10 |
| 10388533 | Process integration method to tune resistivity of nickel silicide | He Ren, Minrui Yu | 2019-08-20 |
| 10256144 | Process integration approach of selective tungsten via fill | He Ren, Feiyue Ma, Yu Lei, Kai Wu, Zhiyuan Wu +2 more | 2019-04-09 |
| 10204764 | Methods for forming a metal silicide interconnection nanowire structure | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Ludovic Godet +1 more | 2019-02-12 |
| 10170299 | Method to reduce trap-induced capacitance in interconnect dielectric barrier stack | He Ren, Yong Cao, Yana Cheng, Weifeng YE | 2019-01-01 |