Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510610 | Structure and method of forming fin device having improved fin liner | Min Gyu Sung, Naushad K. Variam, Sony Varghese, Jae-Young Lee | 2019-12-17 |
| 10510870 | Techniques for forming device having etch-resistant isolation oxide | Min Gyu Sung, Sony Varghese, Jae-Young Lee | 2019-12-17 |
| 10403552 | Replacement gate formation with angled etch and deposition | Min Gyu Sung, Naushad K. Variam, Sony Varghese, Jae-Young Lee | 2019-09-03 |
| 10269663 | Critical dimensions variance compensation | Morgan Evans, Tristan Y. Ma, Kevin Anglin, Motoya Okazaki | 2019-04-23 |