Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510610 | Structure and method of forming fin device having improved fin liner | Min Gyu Sung, Naushad K. Variam, Johannes M. van Meer, Jae-Young Lee | 2019-12-17 |
| 10510870 | Techniques for forming device having etch-resistant isolation oxide | Min Gyu Sung, Jae-Young Lee, Johannes M. van Meer | 2019-12-17 |
| 10403552 | Replacement gate formation with angled etch and deposition | Min Gyu Sung, Naushad K. Variam, Johannes M. van Meer, Jae-Young Lee | 2019-09-03 |
| 10403738 | Techniques for improved spacer in nanosheet device | Min Gyu Sung, Rajesh Prasad, John Hautala | 2019-09-03 |