Issued Patents 2018
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10133163 | Light source unit and optical engine | — | 2018-11-20 |
| 10101669 | Exposure apparatus, resist pattern forming method, and storage medium | Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-10-16 |
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-09-11 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-09-11 |
| 10025187 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | Seiichi Tagawa, Akihiro Oshima | 2018-07-17 |
| 10025190 | Substrate treatment system | Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-07-17 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Akihiro Oshima | 2018-05-15 |