Issued Patents 2018
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara | 2018-09-11 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara | 2018-09-11 |
| 10025187 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | Seiji Nagahara, Seiichi Tagawa | 2018-07-17 |
| 10025190 | Substrate treatment system | Seiji Nagahara, Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI +2 more | 2018-07-17 |
| 9977332 | Resist patterning method, latent resist image forming device, resist patterning device, and resist material | Seiichi Tagawa | 2018-05-22 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara | 2018-05-15 |