Issued Patents 2018
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10144115 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more | 2018-12-04 |
| 10105825 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more | 2018-10-23 |
| 10106662 | Thermoplastic poromeric polishing pad | Shuiyuan Luo, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki +2 more | 2018-10-23 |
| 10092998 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-10-09 |
| 10086494 | High planarization efficiency chemical mechanical polishing pads and methods of making | Jonathan G. Weis, Bhawesh Kumar, Sarah E. Mastroianni, Wenjun Xu, Nan-Rong Chiou +1 more | 2018-10-02 |
| 10011002 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-07-03 |
| 10005172 | Controlled-porosity method for forming polishing pad | Yuhua Tong, Andrew Wank, Diego Lugo, Marc R. Stack, David Michael Veneziale +2 more | 2018-06-26 |
| 9925637 | Tapered poromeric polishing pad | Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang +1 more | 2018-03-27 |