SL

Shuiyuan Luo

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #12 of 43Top 30%
📍 Xiamen, MI: #1 of 2 inventorsTop 50%
Overall (2018): #103,083 of 503,207Top 25%
2
Patents 2018

Issued Patents 2018

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10106662 Thermoplastic poromeric polishing pad George C. Jacob, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki +2 more 2018-10-23
9925637 Tapered poromeric polishing pad Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang +1 more 2018-03-27