JW

Jonathan G. Weis

Dow Global Technologies: 1 patents #318 of 857Top 40%
RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 43Top 45%
📍 Allison Park, PA: #11 of 17 inventorsTop 65%
🗺 Pennsylvania: #2,306 of 7,336 inventorsTop 35%
Overall (2018): #357,737 of 503,207Top 75%
1
Patents 2018

Issued Patents 2018

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10086494 High planarization efficiency chemical mechanical polishing pads and methods of making George C. Jacob, Bhawesh Kumar, Sarah E. Mastroianni, Wenjun Xu, Nan-Rong Chiou +1 more 2018-10-02