Issued Patents 2018
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10086494 | High planarization efficiency chemical mechanical polishing pads and methods of making | Jonathan G. Weis, George C. Jacob, Bhawesh Kumar, Wenjun Xu, Nan-Rong Chiou +1 more | 2018-10-02 |