YT

Yuhua Tong

Dow Global Technologies: 5 patents #20 of 857Top 3%
RH Rohm And Haas Electronic Materials Cmp Holdings: 5 patents #2 of 43Top 5%
📍 Hockessin, DE: #3 of 63 inventorsTop 5%
🗺 Delaware: #22 of 598 inventorsTop 4%
Overall (2018): #22,108 of 503,207Top 5%
5
Patents 2018

Issued Patents 2018

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
10144115 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Jeffrey B. Miller +5 more 2018-12-04
10105825 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Jeffrey B. Miller +5 more 2018-10-23
10092998 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Diego Lugo +6 more 2018-10-09
10011002 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Diego Lugo +6 more 2018-07-03
10005172 Controlled-porosity method for forming polishing pad Andrew Wank, Diego Lugo, Marc R. Stack, David Michael Veneziale, Marty W. DeGroot +2 more 2018-06-26