Issued Patents 2018
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10128239 | Preserving channel strain in fin cuts | Dechao Guo, Ravikumar Ramachandran, Rajasekhar Venigalla | 2018-11-13 |
| 10128238 | Integrated circuit having oxidized gate cut region and method to fabricate same | Kangguo Cheng, Peng Xu | 2018-11-13 |
| 10083961 | Gate cut with integrated etch stop layer | Marc A. Bergendahl, Rajasekhar Venigalla | 2018-09-25 |
| 10083861 | HDP fill with reduced void formation and spacer damage | Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-09-25 |
| 10079287 | Gate cut device fabrication with extended height gates | Kangguo Cheng, John R. Sporre, Peng Xu | 2018-09-18 |
| 10002792 | HDP fill with reduced void formation and spacer damage | Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-06-19 |
| 9935003 | HDP fill with reduced void formation and spacer damage | Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-04-03 |
| 9929057 | HDP fill with reduced void formation and spacer damage | Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-03-27 |
| 9923080 | Gate height control and ILD protection | John R. Sporre, Stan Tsai, Ruilong Xie | 2018-03-20 |
| 9923078 | Trench silicide contacts with high selectivity process | Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-03-20 |
| 9911823 | POC process flow for conformal recess fill | Sanjay C. Mehta, Balasubramanian Pranatharthiharan, Ruilong Xie | 2018-03-06 |