| 10141232 |
Vertical CMOS devices with common gate stacks |
Choonghyun Lee, Soon-Cheon Seo |
2018-11-27 |
| 10115800 |
Vertical fin bipolar junction transistor with high germanium content silicon germanium base |
Seyoung Kim, Choonghyun Lee, Soon-Cheon Seo |
2018-10-30 |
| 10074569 |
Minimize middle-of-line contact line shorts |
Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-09-11 |
| 10043904 |
Method and structure of improving contact resistance for passive and long channel devices |
Soon-Cheon Seo, Balasubramanian Pranatharthiharan, Charan V. Surisetty |
2018-08-07 |
| 10020306 |
Spacer for trench epitaxial structures |
Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-07-10 |
| 10014220 |
Self heating reduction for analog radio frequency (RF) device |
Balasubramanian Pranatharthiharan, Charan V. Surisetty, Soon-Cheon Seo, Tenko Yamashita |
2018-07-03 |
| 10014295 |
Self heating reduction for analog radio frequency (RF) device |
Balasubramanian Pranatharthiharan, Charan V. Surisetty, Soon-Cheon Seo, Tenko Yamashita |
2018-07-03 |
| 9985027 |
Stable multiple threshold voltage devices on replacement metal gate CMOS devices |
Su Chen Fan, Sivananda K. Kanakasabapathy, Tenko Yamashita |
2018-05-29 |
| 9953976 |
Effective device formation for advanced technology nodes with aggressive fin-pitch scaling |
Sanjay C. Mehta, Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-04-24 |
| 9905665 |
Replacement metal gate stack for diffusion prevention |
Takashi Ando, Johnathan E. Faltermeier, Su Chen Fan, Sivananda K. Kanakasabapathy, Tenko Yamashita |
2018-02-27 |
| 9905463 |
Self-aligned low dielectric constant gate cap and a method of forming the same |
Balasubramanian Pranatharthiharan, Charan V. Surisetty |
2018-02-27 |
| 9905421 |
Improving channel strain and controlling lateral epitaxial growth of the source and drain in FinFET devices |
Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-02-27 |
| 9893085 |
Integrated circuit (IC) with offset gate sidewall contacts and method of manufacture |
Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-02-13 |
| 9887289 |
Method and structure of improving contact resistance for passive and long channel devices |
Soon-Cheon Seo, Balasubramanian Pranatharthiharan, Charan V. Surisetty |
2018-02-06 |
| 9871099 |
Nanosheet isolation for bulk CMOS non-planar devices |
Balasubramanian Pranatharthiharan, Soon-Cheon Seo, Charan V. Surisetty |
2018-01-16 |
