| 10114921 |
Method and recording medium of reducing chemoepitaxy directed self-assembled defects |
Michael A. Guillorn, Kafai Lai, Chi-Chun Liu, Ananthan Raghunathan |
2018-10-30 |
| 10081740 |
Directed self-assembly |
Joy Cheng, Michael A. Guillorn, Chi-Chun Liu, Jed W. Pitera |
2018-09-25 |
| 10059820 |
Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers |
Markus Brink, Joy Cheng, Alexander Friz, Michael A. Guillorn, Chi-Chun Liu +3 more |
2018-08-28 |
| 10043668 |
Selective dry etch for directed self assembly of block copolymers |
Sebastian U. Engelmann, Ashish Jagtiani, Hiroyuki Miyazoe |
2018-08-07 |
| 10037398 |
Pattern decomposition method for wiring patterns with chemoepitaxy based directed self assembly |
Markus Brink, Joy Cheng, Gregory S. Doerk, Michael A. Guillorn, Kafai Lai |
2018-07-31 |
| 9941121 |
Selective dry etch for directed self assembly of block copolymers |
Sebastian U. Engelmann, Ashish Jagtiani, Hiroyuki Miyazoe |
2018-04-10 |
| 9933420 |
Graphene nanomesh based charge sensor |
Ali Afzali-Ardakani, Shu-Jen Han, Amal Kasry, Ahmed Maarouf, Glenn J. Martyna +1 more |
2018-04-03 |
| 9911603 |
Pattern decomposition for directed self assembly patterns templated by sidewall image transfer |
Joy Cheng, Michael A. Guillorn, Chi-Chun Liu |
2018-03-06 |
| 9884978 |
Directed self-assembly |
Joy Cheng, Michael A. Guillorn, Chi-Chun Liu, Jed W. Pitera |
2018-02-06 |
| 9881793 |
Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning |
Sebastian U. Engelmann, Mahmoud Khojasteh, Deborah A. Neumayer, John M. Papalia |
2018-01-30 |
