| 10128352 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2018-11-13 |
| 10026824 |
Air-gap gate sidewall spacer and method |
Daniel Chanemougame, Ruilong Xie, Lars Liebmann, Nigel G. Cave, Guillaume Bouche |
2018-07-17 |
| 10014215 |
Method and apparatus for placing a gate contact inside a semiconductor active region having high-k dielectric gate caps |
Ruilong Xie, Xunyuan Zhang |
2018-07-03 |
| 9947589 |
Methods of forming a gate contact for a transistor above an active region and the resulting device |
Chanro Park, Ruilong Xie, Lars Liebmann, Nigel G. Cave, Mark V. Raymond |
2018-04-17 |
| 9941278 |
Method and apparatus for placing a gate contact inside an active region of a semiconductor |
Ruilong Xie, Xunyuan Zhang |
2018-04-10 |
| 9941163 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2018-04-10 |
| 9929049 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2018-03-27 |
| 9929048 |
Middle of the line (MOL) contacts with two-dimensional self-alignment |
Ruilong Xie, Chanro Park, Lars Liebmann |
2018-03-27 |
| 9899259 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2018-02-20 |
