DE

Dirk Heinrich Ehm

CG Carl Zeiss Smt Gmbh: 4 patents #20 of 287Top 7%
AB Asml Netherlands B.V.: 1 patents #194 of 559Top 35%
📍 Beckingen, DE: #1 of 3 inventorsTop 35%
Overall (2018): #46,541 of 503,207Top 10%
4
Patents 2018

Issued Patents 2018

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10073361 EUV lithography system and operating method Stefan Schmidt, Edgar Osorio, Edwin Te Sligte, Mark Zellenrath, Hella Logtenberg 2018-09-11
10061205 Reflective optical element Moritz Becker, Irene Ament, Gisela Von Blanckenhagen, Joern WEBER 2018-08-28
9996005 Reflective optical element and optical system for EUV lithography Peter Huber, Stephan Muellender, Gisela Von Blanckenhagen 2018-06-12
9880476 Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus Gisela Von Blanckenhagen 2018-01-30