Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10156782 | Mask for EUV lithography, EUV lithography apparatus and method for determining a contrast proportion caused by DUV radiation | — | 2018-12-18 |
| 9996005 | Reflective optical element and optical system for EUV lithography | Dirk Heinrich Ehm, Stephan Muellender, Gisela Von Blanckenhagen | 2018-06-12 |