Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10139735 | Lithographic apparatus and method | Johannes Jacobus Matheus Baselmans, Hans Butler, Christiaan Alexander Hoogendam, Sander Kerssemakers, Bart Smeets +1 more | 2018-11-27 |
| 10031428 | Gas flow optimization in reticle stage environment | Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven +9 more | 2018-07-24 |