LL

Leon Martin Levasier

AB Asml Netherlands B.V.: 1 patents #194 of 559Top 35%
📍 Hedel, NL: #3 of 3 inventorsTop 100%
Overall (2018): #331,540 of 503,207Top 70%
1
Patents 2018

Issued Patents 2018

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9983489 Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets +3 more 2018-05-29