Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10032644 | Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives | Xiaobo Shi, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli | 2018-07-24 |
| 10011741 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo, II, Jae-ouk Choo +6 more | 2018-07-03 |
| 9978609 | Low dishing copper chemical mechanical planarization | Xiaobo Shi, Joseph D. Rose, Mark Leonard O'Neill, Malcolm Grief | 2018-05-22 |