| 9768062 |
Method for forming low parasitic capacitance source and drain contacts |
Jorge A. Kittl, David Seo, Kota OIKAWA, Kim Changhwa, Mark S. Rodder |
2017-09-19 |
| 9728502 |
Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same |
Ganesh Hegde, Mark S. Rodder, Chris Bowen |
2017-08-08 |
| 9691860 |
Methods of forming defect-free SRB onto lattice-mismatched substrates and defect-free fins on insulators |
Wei-E Wang, Mark S. Rodder |
2017-06-27 |
| 9685564 |
Gate-all-around field effect transistors with horizontal nanosheet conductive channel structures for MOL/inter-channel spacing and related cell architectures |
Mark S. Rodder, Joon Goo Hong, Titash Rakshit |
2017-06-20 |
| 9659871 |
Semiconductor device |
Raheel Azmat, Chulhong Park, Kwanyoung Chun |
2017-05-23 |
| 9570395 |
Semiconductor device having buried power rail |
Joon Goo Hong, Mark S. Rodder |
2017-02-14 |