Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9720322 | Photoresist composition, compound, and production method thereof | Hayato Namai, Norihiko Ikeda | 2017-08-01 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Hiromitsu Nakashima | 2017-03-21 |