Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9720322 | Photoresist composition, compound, and production method thereof | Hayato Namai, Takanori Kawakami | 2017-08-01 |
| 9588423 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Hayato Namai | 2017-03-07 |