Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9760004 | Radiation-sensitive resin composition and resist pattern-forming method | Hiromu MIYATA, Masafumi Hori | 2017-09-12 |
| 9720322 | Photoresist composition, compound, and production method thereof | Norihiko Ikeda, Takanori Kawakami | 2017-08-01 |
| 9703195 | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound | Kota Nishino | 2017-07-11 |
| 9594303 | Resist pattern-forming method and photoresist composition | Hitoshi Osaki, Shinya Minegishi | 2017-03-14 |
| 9588423 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Norihiko Ikeda | 2017-03-07 |
| 9557641 | Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound | — | 2017-01-31 |