Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9738746 | Composition for pattern formation, pattern-forming method, and block copolymer | Hiroyuki Komatsu, Tomoki Nagai | 2017-08-22 |
| 9690192 | Composition for base, and directed self-assembly lithography method | Hiroyuki Komatsu, Shinya Minegishi, Kaori Sakai, Tomoki Nagai | 2017-06-27 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |
| 9599892 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-03-21 |
| 9587065 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-03-07 |
| 9557644 | Base film-forming composition, and directed self-assembly lithography method | Hiroyuki Komatsu, Shinya Minegishi, Kaori Sakai, Tomoki Nagai | 2017-01-31 |
| 9534135 | Composition for pattern formation, and pattern-forming method | Hiroyuki Komatsu, Shinya Minegishi, Tomoki Nagai | 2017-01-03 |