Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |