Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9711365 | Etch rate enhancement for a silicon etch process through etch chamber pretreatment | Eric A. Joseph, Goh Matsuura, Masahiro Nakamura, Edmund M. Sikorski | 2017-07-18 |
| 9536731 | Wet clean process for removing CxHyFz etch residue | Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Mahmoud Khojasteh, Masahiro Nakamura +3 more | 2017-01-03 |