Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9719170 | Patterned block copolymer structure with oxide lines for line density multiplication | Ricardo Ruiz | 2017-08-01 |
| 9640415 | Robust ink formulations for durable markings on microelectronic packages and its extendibility as a barrier material for thermal and sealant materials | Randall D. Lowe, Jr., Suriyakala Ramalingam, Nisha Ananthakrishnan, James C. Matayabas, Jr., Arjun Krishnan | 2017-05-02 |