Issued Patents 2017
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9837262 | Method of manufacturing a SiOCN film, substrate processing apparatus and recording medium | Yoshinobu Nakamura | 2017-12-05 |
| 9691606 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshitomo HASHIMOTO, Yoshiro Hirose, Katsuyoshi Harada, Yoshinobu Nakamura | 2017-06-27 |
| 9620357 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshitomo HASHIMOTO, Yoshiro Hirose, Shingo NOHARA, Katsuyoshi Harada, Yuji Urano | 2017-04-11 |
| D783351 | Gas nozzle substrate processing apparatus | Toshiki Fujino, Kosuke Takagi | 2017-04-11 |