| 9817927 |
Hard mask etch and dielectric etch aware overlap for via and metal layers |
Guo Xiang Ning, Yuping Ren, David N. Power, Lalit Shokeen, Chin Teong Lim +1 more |
2017-11-14 |
| 9817940 |
Method wherein test cells and dummy cells are included into a layout of an integrated circuit |
Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim |
2017-11-14 |
| 9798238 |
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques |
Guo Xiang Ning, Arthur Hotzel, Soon Yoeng Tan |
2017-10-24 |
| 9791772 |
Monitoring pattern for devices |
Guoxiang Ning, Byoung Il Choi |
2017-10-17 |
| 9672313 |
Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device |
Guoxiang Ning, Yuping Ren, Chin Teong Lim, Xusheng Wu |
2017-06-06 |
| 9672312 |
Method wherein test cells and dummy cells are included into a layout of an integrated circuit |
Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim |
2017-06-06 |
| 9658531 |
Semiconductor device resolution enhancement by etching multiple sides of a mask |
Guoxiang Ning, Chunyu WONG, Sarasvathi Thangaraju |
2017-05-23 |
| 9645486 |
Multiple threshold convergent OPC model |
Chin Teong Lim, Guoxiang Ning |
2017-05-09 |
| 9535319 |
Reticle, system comprising a plurality of reticles and method for the formation thereof |
Guido Ueberreiter, Guoxiang Ning, Jui-Hsuan Feng, Chin Teong Lim |
2017-01-03 |
