Issued Patents 2017
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9799578 | Peak-based endpointing for chemical mechanical polishing | Boguslaw A. Swedek, David J. Lischka | 2017-10-24 |
| 9754846 | Inductive monitoring of conductive trench depth | Wei Lu, Zhefu Wang, Zhihong Wang, Hassan G. Iravani, Ingemar Carlsson +2 more | 2017-09-05 |
| 9607910 | Limiting adjustment of polishing rates during substrate polishing | Benjamin Cherian, Sivakumar Dhandapani, Harry Q. Lee | 2017-03-28 |
| 9583405 | Endpointing detection for chemical mechanical polishing based on spectrometry | Jeffrey Drue David, Boguslaw A. Swedek | 2017-02-28 |
| 9564377 | Peak-based endpointing for chemical mechanical polishing | Boguslaw A. Swedek, David J. Lischka | 2017-02-07 |