FY

Fengji Yeh

Dow Global Technologies: 4 patents #40 of 820Top 5%
RH Rohm And Haas Electronic Materials Cmp Holdings: 4 patents #4 of 34Top 15%
📍 Wilmington, DE: #17 of 250 inventorsTop 7%
🗺 Delaware: #36 of 601 inventorsTop 6%
Overall (2016): #44,305 of 481,213Top 10%
4
Patents 2016

Issued Patents 2016

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9259820 Chemical mechanical polishing pad with polishing layer and window Bainian Qian, Marty W. DeGroot, James Murnane, Angus Repper, Michelle Jensen +3 more 2016-02-16
9238295 Soft and conditionable chemical mechanical window polishing pad Bainian Qian, Michelle Jensen, Marty W. DeGroot, Angus Repper, James Murnane +3 more 2016-01-19
9238296 Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more 2016-01-19
9233451 Soft and conditionable chemical mechanical polishing pad stack James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more 2016-01-12