JM

James Murnane

Dow Global Technologies: 4 patents #40 of 820Top 5%
RH Rohm And Haas Electronic Materials Cmp Holdings: 4 patents #4 of 34Top 15%
📍 Norristown, PA: #5 of 35 inventorsTop 15%
🗺 Pennsylvania: #345 of 7,031 inventorsTop 5%
Overall (2016): #42,270 of 481,213Top 9%
4
Patents 2016

Issued Patents 2016

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9259820 Chemical mechanical polishing pad with polishing layer and window Bainian Qian, Marty W. DeGroot, Angus Repper, Michelle Jensen, Jeffrey James Hendron +3 more 2016-02-16
9238295 Soft and conditionable chemical mechanical window polishing pad Bainian Qian, Michelle Jensen, Marty W. DeGroot, Angus Repper, Jeffrey James Hendron +3 more 2016-01-19
9238296 Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron, Marty W. DeGroot +2 more 2016-01-19
9233451 Soft and conditionable chemical mechanical polishing pad stack Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron, Marty W. DeGroot +2 more 2016-01-12