BQ

Bainian Qian

RH Rohm And Haas Electronic Materials Cmp Holdings: 12 patents #1 of 34Top 3%
Dow Global Technologies: 10 patents #5 of 820Top 1%
📍 Nonatum Mills, DE: #1 of 28 inventorsTop 4%
🗺 Delaware: #3 of 601 inventorsTop 1%
Overall (2016): #3,996 of 481,213Top 1%
13
Patents 2016

Issued Patents 2016

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
9484212 Chemical mechanical polishing method Yi Guo, Marty W. DeGroot, George C. Jacob 2016-11-01
9481070 High-stability polyurethane polishing pad George C. Jacob, Kun-Ming Tsai 2016-11-01
9475168 Polishing pad window Ethan S. Simon, George C. Jacob 2016-10-25
9457449 Chemical mechanical polishing pad with composite polishing layer Teresa Brugarolas Brufau, Julia Kozhukh 2016-10-04
9452507 Controlled-viscosity CMP casting method George C. Jacob 2016-09-27
9446498 Chemical mechanical polishing pad with window Joseph So, Janet Tesfai 2016-09-20
9333620 Chemical mechanical polishing pad with clear endpoint detection window Marty W. DeGroot 2016-05-10
9314897 Chemical mechanical polishing pad with endpoint detection window Marty W. DeGroot 2016-04-19
9259821 Chemical mechanical polishing layer formulation with conditioning tolerance Marty W. DeGroot, Mark F. Sonnenschein 2016-02-16
9259820 Chemical mechanical polishing pad with polishing layer and window Marty W. DeGroot, James Murnane, Angus Repper, Michelle Jensen, Jeffrey James Hendron +3 more 2016-02-16
9238296 Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer James Murnane, John G. Nowland, Michelle Jensen, Jeffrey James Hendron, Marty W. DeGroot +2 more 2016-01-19
9238295 Soft and conditionable chemical mechanical window polishing pad Michelle Jensen, Marty W. DeGroot, Angus Repper, James Murnane, Jeffrey James Hendron +3 more 2016-01-19
9233451 Soft and conditionable chemical mechanical polishing pad stack James Murnane, John G. Nowland, Michelle Jensen, Jeffrey James Hendron, Marty W. DeGroot +2 more 2016-01-12