Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2016-11-22 |
| 9261789 | Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method | Takahiro Hayama, Kazunori Kusabiraki, Ken MARUYAMA, Kiyoshi Tanaka | 2016-02-16 |