Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9304393 | Radiation-sensitive resin composition and compound | Kazuo Nakahara | 2016-04-05 |
| 9261789 | Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method | Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Kiyoshi Tanaka | 2016-02-16 |