Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi +3 more | 2016-12-06 |
| 9323146 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | Hayato Namai, Norihiko Ikeda | 2016-04-26 |
| 9304393 | Radiation-sensitive resin composition and compound | Ken MARUYAMA | 2016-04-05 |