Issued Patents 2016
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529259 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | — | 2016-12-27 |
| 9477149 | Photoresist composition, compound, and production method thereof | Norihiko Ikeda, Takanori Kawakami | 2016-10-25 |
| 9465291 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | — | 2016-10-11 |
| 9412593 | Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method | Goji Wakamatsu | 2016-08-09 |
| 9323146 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | Kazuo Nakahara, Norihiko Ikeda | 2016-04-26 |
| 9233840 | Method for improving self-assembled polymer features | Joy Cheng, Daniel P. Sanders | 2016-01-12 |