Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513548 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | Yuusuke Asano, Mitsuo Satou, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori +3 more | 2016-12-06 |
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2016-11-22 |
| 9268219 | Photoresist composition and resist pattern-forming method | Hiromu MIYATA, Masafumi Yoshida | 2016-02-23 |