Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2016-11-22 |
| 9400429 | Composition for forming a resist underlayer film, and pattern-forming method | Fumihiro Toyokawa, Shin-ya Nakafuji | 2016-07-26 |