| 9530733 |
Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regions |
James M. Blackwell, Scott B. Clendenning, Florian Gstrein, Eungnak Han, Grant Kloster +3 more |
2016-12-27 |
| 9530688 |
Directed self assembly of block copolymers to form vias aligned with interconnects |
Paul A. Nyhus, Swaminathan Sivakumar |
2016-12-27 |
| 9443922 |
Metal-insulator-metal capacitor formation techniques |
Mauro J. Kobrinsky, Michael C. Mayberry |
2016-09-13 |
| 9418888 |
Non-lithographically patterned directed self assembly alignment promotion layers |
Rami Hourani, Eungnak Han, James M. Blackwell |
2016-08-16 |
| 9406512 |
Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects |
James M. Blackwell, Alan M. Myers, Kanwal Jit Singh |
2016-08-02 |
| 9285682 |
Pre-patterned hard mask for ultrafast lithographic imaging |
Paul A. Nyhus, Charles H. Wallace |
2016-03-15 |
| 9236342 |
Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnects |
Kevin Lin, Kanwal Jit Singh, Alan M. Myers, Richard E. Schenker |
2016-01-12 |