Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9508801 | Stacked graphene field-effect transistor | Aaron D. Franklin, Satoshi Oida, Joshua T. Smith | 2016-11-29 |
| 9493879 | Selective sputtering for pattern transfer | Mark Hoinkis, Eric A. Joseph | 2016-11-15 |
| 9484220 | Sputter etch processing for heavy metal patterning in integrated circuits | Mark Hoinkis, Eric A. Joseph, Chun Yan | 2016-11-01 |
| 9472499 | Self-aligned pitch split for unidirectional metal wiring | Josephine B. Chang, Michael A. Guillorn, Eric A. Joseph | 2016-10-18 |
| 9437443 | Low-temperature sidewall image transfer process using ALD metals, metal oxides and metal nitrides | Markus Brink, Michael A. Guillorn, Sebastian U. Engelmann, Adam M. Pyzyna, Jeffrey W. Sleight | 2016-09-06 |
| 9349640 | Electrode pair fabrication using directed self assembly of diblock copolymers | Josephine B. Chang, Michael A. Guillorn, Adam M. Pyzyna, HsinYu Tsai | 2016-05-24 |
| 9337033 | Dielectric tone inversion materials | Martin Glodde, Wu-Song Huang, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-05-10 |
| 9318692 | Self-limited crack etch to prevent device shorting | Brian A. Bryce, Josephine B. Chang | 2016-04-19 |
| 9306164 | Electrode pair fabrication using directed self assembly of diblock copolymers | Josephine B. Chang, Michael A. Guillorn, Adam M. Pyzyna, HsinYu Tsai | 2016-04-05 |
| 9281212 | Dielectric tone inversion materials | Martin Glodde, Wu-Song Huang, Ratnam Sooriyakumaran, HsinYu Tsai | 2016-03-08 |
| 9263393 | Sputter and surface modification etch processing for metal patterning in integrated circuits | Cyril Cabral, Jr., Benjamin L. Fletcher, Nicholas C. M. Fuller, Eric A. Joseph | 2016-02-16 |