RE

Remi Daniel Marie Edart

AB Asml Netherlands B.V.: 2 patents #110 of 517Top 25%
Overall (2016): #106,040 of 481,213Top 25%
2
Patents 2016

Issued Patents 2016

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9454084 Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system Irina Lyulina, Franciscus Godefridus Casper Bijnen, Antoine Gaston Marie Kiers, Michael Kubis 2016-09-27
9291916 Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Xiuhong Wei, Irina Lyulina +1 more 2016-03-22