Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9454084 | Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system | Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Michael Kubis | 2016-09-27 |
| 9360769 | Method of determining focus corrections, lithographic processing cell and device manufacturing method | Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes | 2016-06-07 |
| 9360770 | Method of determining focus corrections, lithographic processing cell and device manufacturing method | Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes | 2016-06-07 |