Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9454084 | Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system | Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis | 2016-09-27 |
| 9291916 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei +1 more | 2016-03-22 |