Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7999355 | Aminosilanes for shallow trench isolation films | Scott J. Weigel, Mark Leonard O'Neill, Bing Han, Hansong Cheng, Chia-Chien Lee | 2011-08-16 |
| 7960205 | Tellurium precursors for GST films in an ALD or CVD process | Liu Yang, Thomas Richard Gaffney | 2011-06-14 |
| 7943195 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, John Anthony Thomas Norman | 2011-05-17 |
| 7932413 | Precursors for CVD silicon carbo-nitride films | Arthur Kenneth Hochberg | 2011-04-26 |
| 7875312 | Process for producing silicon oxide films for organoaminosilane precursors | Hareesh Thridandam, Xinjian Lei, Thomas Richard Gaffney | 2011-01-25 |
| 7875556 | Precursors for CVD silicon carbo-nitride and silicon nitride films | Arthur Kenneth Hochberg | 2011-01-25 |