Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8053311 | Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen | Takashi Nakagawa, Naomu Kitano | 2011-11-08 |
| 8030694 | Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen | Takashi Nakagawa, Naomu Kitano | 2011-10-04 |
| 7968463 | Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer | Takashi Nakagawa, Makiko Oshida, Nobuyuki Ikarashi, Kensuke Takahashi, Kenzo Manabe | 2011-06-28 |
| 7867847 | Method of manufacturing dielectric film that has hafnium-containing and aluminum-containing oxynitride | Naomu Kitano, Takashi Nakagawa | 2011-01-11 |