Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977242 | Double mask self-aligned double patterning technology (SADPT) process | Lumin Li, Andrew R. Romano | 2011-07-12 |
| 7910489 | Infinitely selective photoresist mask etch | Ji Soo Kim, Peter Cirigliano, Sangheon Lee, Dongho Heo, Daehan Choi | 2011-03-22 |
| 7902073 | Glue layer for hydrofluorocarbon etch | Ji Soo Kim, Sangheon Lee, Deepak Gupta | 2011-03-08 |