Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8083890 | Gas modulation to control edge exclusion in a bevel edge etching plasma chamber | Tong Fang, Yunsang Kim, Olivier Rigoutat, George Stojakovic | 2011-12-27 |
| 8017516 | Method for stress free conductor removal | Shrikant Lohokare | 2011-09-13 |
| 7981307 | Method and apparatus for shaping gas profile near bevel edge | Jack Chen, Iqbal Shareef | 2011-07-19 |
| 7959984 | Methods and arrangement for the reduction of byproduct deposition in a plasma processing system | Shrikant Lohokare | 2011-06-14 |
| 7943007 | Configurable bevel etcher | Alan M. Schoepp, Gregory Sexton, Yunsang Kim, William S. Kennedy | 2011-05-17 |
| 7938931 | Edge electrodes with variable power | Gregory Sexton, Andras Kuthi | 2011-05-10 |
| 7922866 | Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Gregory Sexton, Alan M. Schoepp, John D. Boniface | 2011-04-12 |
| 7909960 | Apparatus and methods to remove films on bevel edge and backside of wafer | Yunsang Kim | 2011-03-22 |